Please use this identifier to cite or link to this item: https://ah.lib.nccu.edu.tw/handle/140.119/10256
DC FieldValueLanguage
dc.creator洪叔民;J.W. Fowler;L.K. Cochranzh_TW
dc.date2000-04en_US
dc.date.accessioned2008-11-25T02:41:29Z-
dc.date.available2008-11-25T02:41:29Z-
dc.date.issued2008-11-25T02:41:29Z-
dc.identifier.urihttps://nccur.lib.nccu.edu.tw/handle/140.119/10256-
dc.formatapplication/en_US
dc.languageenen_US
dc.languageen-USen_US
dc.language.isoen_US-
dc.relationInternational Journal of Manufacturing Technology and Management, 1(2/3), 156-172en_US
dc.titleA Genetic Algorithms Approach to Manage Ion Implantation Processes in Wafer Fabricationen_US
dc.typearticleen
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.fulltextNo Fulltext-
item.grantfulltextnone-
item.languageiso639-1en_US-
item.openairetypearticle-
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