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題名 Anti-site defect effect on the electronic structure of a Bi2Te3 topological insulator
作者 Chuang, PY;Su, SH;Chong, CW;Chen, YF;Chou, YH;Huang, JCA;Chen, WC;Cheng, CM;Tsuei, KD;Wang, CH;Yang, YW;Liao, YF;Weng, SC;Lee, JF;Lan, YK;Chang, SL;Lee, CH;Yang, CK;Su, HL;Wu, YC
楊志開
Yang, Chih-Kai
貢獻者 應物所
日期 2018
上傳時間 6-十一月-2018 14:55:14 (UTC+8)
摘要 Tuning the Fermi level (EF) in Bi2Te3 topological-insulator (TI) films is demonstrated on controlling the temperature of growth with molecular-beam epitaxy (MBE). Angle-resolved photoemission spectra (ARPES) reveal that EF of Bi2Te3 thin films shifts systematically with the growth temperature (Tg). The key role that a Bi-on-Te(1) (BiTe1) antisite defect plays in the electronic structure is identified through extended X-ray-absorption fine-structure (EXAFS) spectra at the Bi L-3-edge. Calculations of electronic structure support the results of fitting the EXAFS, indicating that the variation of EF is due to the formation and suppression of BiTe1 that is tunable with the growth temperature. Our findings provide not only insight into the correlation between the defect structure and electronic properties but also a simple route to control the intrinsic topological surface states, which could be useful for applications in TIbased advanced electronic and spintronic devices.
關聯 RSC ADVANCES, 8(1), 423-428
資料類型 article
DOI http://dx.doi.org/10.1039/c7ra08995c
dc.contributor 應物所
dc.creator (作者) Chuang, PY;Su, SH;Chong, CW;Chen, YF;Chou, YH;Huang, JCA;Chen, WC;Cheng, CM;Tsuei, KD;Wang, CH;Yang, YW;Liao, YF;Weng, SC;Lee, JF;Lan, YK;Chang, SL;Lee, CH;Yang, CK;Su, HL;Wu, YC
dc.creator (作者) 楊志開
dc.creator (作者) Yang, Chih-Kai
dc.date (日期) 2018
dc.date.accessioned 6-十一月-2018 14:55:14 (UTC+8)-
dc.date.available 6-十一月-2018 14:55:14 (UTC+8)-
dc.date.issued (上傳時間) 6-十一月-2018 14:55:14 (UTC+8)-
dc.identifier.uri (URI) http://nccur.lib.nccu.edu.tw/handle/140.119/120828-
dc.description.abstract (摘要) Tuning the Fermi level (EF) in Bi2Te3 topological-insulator (TI) films is demonstrated on controlling the temperature of growth with molecular-beam epitaxy (MBE). Angle-resolved photoemission spectra (ARPES) reveal that EF of Bi2Te3 thin films shifts systematically with the growth temperature (Tg). The key role that a Bi-on-Te(1) (BiTe1) antisite defect plays in the electronic structure is identified through extended X-ray-absorption fine-structure (EXAFS) spectra at the Bi L-3-edge. Calculations of electronic structure support the results of fitting the EXAFS, indicating that the variation of EF is due to the formation and suppression of BiTe1 that is tunable with the growth temperature. Our findings provide not only insight into the correlation between the defect structure and electronic properties but also a simple route to control the intrinsic topological surface states, which could be useful for applications in TIbased advanced electronic and spintronic devices.en_US
dc.format.extent 129 bytes-
dc.format.mimetype text/html-
dc.relation (關聯) RSC ADVANCES, 8(1), 423-428
dc.title (題名) Anti-site defect effect on the electronic structure of a Bi2Te3 topological insulatoren_US
dc.type (資料類型) article
dc.identifier.doi (DOI) 10.1039/c7ra08995c
dc.doi.uri (DOI) http://dx.doi.org/10.1039/c7ra08995c