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題名 由權利耗盡原則論合法專利物之使用界限—以專利物組裝與修復為中心
作者 沈宗倫
Shen, Chung-lun
貢獻者 法律系
關鍵詞 licensed patented products;the exhaustion doctrine;double royalties;semi-conductor foundry;the doctrine of essential features;the repair-reconstruction dichotomy;patent symmetry;main technique;supporting technique
合法專利物;權利耗盡原則;多重授權金;半導體代工;重要特徵原則;必要侵害原則;利益之對稱性;主要或關鍵技術;次要或非關鍵技術;功能耗竭;
日期 2010-03
上傳時間 3-Jan-2019 16:14:16 (UTC+8)
關聯 臺大法學論叢, Vol.39, No.1, pp.287-352
資料類型 article
dc.contributor 法律系zh_Tw
dc.creator (作者) 沈宗倫zh_TW
dc.creator (作者) Shen, Chung-lunzh_TW
dc.date (日期) 2010-03-
dc.date.accessioned 3-Jan-2019 16:14:16 (UTC+8)-
dc.date.available 3-Jan-2019 16:14:16 (UTC+8)-
dc.date.issued (上傳時間) 3-Jan-2019 16:14:16 (UTC+8)-
dc.identifier.uri (URI) http://nccur.lib.nccu.edu.tw/handle/140.119/121718-
dc.format.extent 109 bytes-
dc.format.mimetype text/html-
dc.relation (關聯) 臺大法學論叢, Vol.39, No.1, pp.287-352-
dc.subject (關鍵詞) licensed patented products;the exhaustion doctrine;double royalties;semi-conductor foundry;the doctrine of essential features;the repair-reconstruction dichotomy;patent symmetry;main technique;supporting techniqueen_US
dc.subject (關鍵詞) 合法專利物;權利耗盡原則;多重授權金;半導體代工;重要特徵原則;必要侵害原則;利益之對稱性;主要或關鍵技術;次要或非關鍵技術;功能耗竭;zh_TW
dc.title (題名) 由權利耗盡原則論合法專利物之使用界限—以專利物組裝與修復為中心en_US
dc.type (資料類型) article-