dc.contributor | 統計系 | - |
dc.creator (作者) | 楊素芬 | - |
dc.creator (作者) | Yang, Su-Fen | - |
dc.creator (作者) | 林建華 | - |
dc.date (日期) | 2021-10 | - |
dc.date.accessioned | 31-五月-2022 13:47:01 (UTC+8) | - |
dc.date.available | 31-五月-2022 13:47:01 (UTC+8) | - |
dc.date.issued (上傳時間) | 31-五月-2022 13:47:01 (UTC+8) | - |
dc.identifier.uri (URI) | http://nccur.lib.nccu.edu.tw/handle/140.119/140185 | - |
dc.description.abstract (摘要) | To improve the quality of manufacturing processes and service processes, control charts are commonly used tools in monitor process shift. The quality characteristic of service data usually follows non-normal or unknown distribution, and hence the traditional charts such as Shewhart control charts should not be properly handle it. Focusing on this problem, we propose a new control chart based on a simple statistic to simultaneously monitor process mean and variance shift. We discuss the average run lengths (ARLs) under various combinations of distributions/parameters. In addition, we recommend a new EWMA control chart because it provides more reasonable in-control ARLs. The simulation studies for normal process, exponential process and gamma process demonstrate that our chart can quickly detect the out-of-control state. | - |
dc.format.extent | 153 bytes | - |
dc.format.mimetype | text/html | - |
dc.relation (關聯) | The 30th South Taiwan Statistics Conference and 2021Chinese Institute of Probability and Statistics Annual Meeting, National Kaohsiung University | - |
dc.subject (關鍵詞) | mean chart; variance chart; multinomial distribution; average run length | - |
dc.title (題名) | A new control scheme for monitoring process mean and variance | - |
dc.type (資料類型) | conference | - |