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題名 Integrated methodologies for mapping and forecasting science and technology trends: A case of etching technology
作者 Wu, Feng-Shang;Shiu, C.-C.
吳豐祥
貢獻者 創新與創造力研究中心
關鍵詞 Bibliometric analysis; Bibliometrics; Integrated method; Integrated methodology; Material processing technology; Patent database; Research fields; Research topics; Science and Technology; Scientific papers; Semiconductor industry; Text mining; Theory and practice; Time-periods; Trend analysis; Trend forecasting; Economics; Etching; Industrial management; Patents and inventions; Semiconductor device manufacture; Semiconductor growth; Technology
日期 2010
上傳時間 10-Jun-2015 12:06:13 (UTC+8)
摘要 This study proposes an integrated trend analysis methodology by applying bibliometric analysis and text mining on both scientific paper and patent database. The bibliometric analysis is investigated in four different dimensions: publication growth, country/region, organization, classification. However, the text mining is obtained by keyword analysis for different time periods and research field maps. The integrated method is applied on etching technology which is a material processing technology particularly important for semiconductor industry. On the basis of the results obtained in the practice of etching technology, six different relations among the proposed two publication database (paper and patent) and two conventional trend forecasting method (bibliometrics and text-mining) are systematically analyzed as a framework for depicting a desirable Sci-Tech trend analysis model: Bibliometric analysis should be investigated first, and then text-mining is subsequently applied to discover important research topics of selected fields. The importance of paper and patent should be equally treated for obtaining a complete result taking into both theory and practice into consideration. © 2010 IEEE.
關聯 PICMET `10 - Portland International Center for Management of Engineering and Technology, Proceedings - Technology Management for Global Economic Growth,2010, 論文編號 5603439, Pages 267-289
資料類型 conference
dc.contributor 創新與創造力研究中心
dc.creator (作者) Wu, Feng-Shang;Shiu, C.-C.
dc.creator (作者) 吳豐祥zh_TW
dc.date (日期) 2010
dc.date.accessioned 10-Jun-2015 12:06:13 (UTC+8)-
dc.date.available 10-Jun-2015 12:06:13 (UTC+8)-
dc.date.issued (上傳時間) 10-Jun-2015 12:06:13 (UTC+8)-
dc.identifier.uri (URI) http://nccur.lib.nccu.edu.tw/handle/140.119/75628-
dc.description.abstract (摘要) This study proposes an integrated trend analysis methodology by applying bibliometric analysis and text mining on both scientific paper and patent database. The bibliometric analysis is investigated in four different dimensions: publication growth, country/region, organization, classification. However, the text mining is obtained by keyword analysis for different time periods and research field maps. The integrated method is applied on etching technology which is a material processing technology particularly important for semiconductor industry. On the basis of the results obtained in the practice of etching technology, six different relations among the proposed two publication database (paper and patent) and two conventional trend forecasting method (bibliometrics and text-mining) are systematically analyzed as a framework for depicting a desirable Sci-Tech trend analysis model: Bibliometric analysis should be investigated first, and then text-mining is subsequently applied to discover important research topics of selected fields. The importance of paper and patent should be equally treated for obtaining a complete result taking into both theory and practice into consideration. © 2010 IEEE.
dc.format.extent 176 bytes-
dc.format.mimetype text/html-
dc.relation (關聯) PICMET `10 - Portland International Center for Management of Engineering and Technology, Proceedings - Technology Management for Global Economic Growth,2010, 論文編號 5603439, Pages 267-289
dc.subject (關鍵詞) Bibliometric analysis; Bibliometrics; Integrated method; Integrated methodology; Material processing technology; Patent database; Research fields; Research topics; Science and Technology; Scientific papers; Semiconductor industry; Text mining; Theory and practice; Time-periods; Trend analysis; Trend forecasting; Economics; Etching; Industrial management; Patents and inventions; Semiconductor device manufacture; Semiconductor growth; Technology
dc.title (題名) Integrated methodologies for mapping and forecasting science and technology trends: A case of etching technology
dc.type (資料類型) conferenceen